Sensitivity of Ambient Secondary Organic Aerosol Formation to Perturbations Measured Using Parallel Photochemical Smog Chambers
Rashmi Rajput1, Shenglun Wu2, Benjamin Schulze3, Ryan Xavier Ward4, Qi Zhang5, Christopher D Cappa6, John Seinfeld3 and Michael Kleeman7, (1)University of California Davis, Atmospheric Science, Davis, United States, (2)University of California Davis, Davis, CA, United States, (3)California Institute of Technology, Pasadena, United States, (4)California Institute of Technology, Pasadena, CA, United States, (5)University of California Davis, Department of Environmental Toxicology, Davis, United States, (6)University of California, Department of Civil and Environmental Engineering, Davis, United States, (7)University of California Davis, Civil and Environmental Engineering, Davis, United States