Study of High-pressure Behavior of Goethite up to 30 GPa using X-ray Diffraction, Raman Spectroscopy and Electrical Impedance

Ruilian Tang, Center for High Pressure Science &Technology Advanced Research, Changchun, China, Jiuhua Chen, Florida International Univ., Miami, FL, United States, Qiaoshi Charles Zeng, Stanford University, Palo Alto, CA, United States, Yan Li, Jilin University, Changchun, China and Xue Liang, Florida International Univ., Miami, United States
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