Preliminary Program subject to change
08E10 Reactor Design and Analysis for Electronic Materials
OverviewEfficient reactor design is key for the optimised manufacturing of electronic materials. In this session we solicit papers describing recent advances in reactor design, optimisation, operation and control for the production of electronic materials, including (but not limited to) techniques such as CVD, etching, CMP, RTP, ALE, etc. Both experimental and computational/modelling papers will be featured. Papers focusing on novel experimental reactor and controller designs and on high-performance computing applications, including multi-scale modelling and modelling of reacting flows and surface kinetics are encouraged.
Primary SponsorElectronics and Photonics (08e)

Chair

Constantinos Theodoropoulos
School of Chemical Engineering and Analytical Science
University of Manchester
Sackville St
Manchester, M60 1QD
United Kingdom
Phone Number: +44 (0)161 200-4386
Fax Number: +44 (0)161 236-7439
Email: k.theodoropoulos@manchester.ac.uk

CoChair

Roger P. Pawlowski
Sandia National Laboratories
P. O. Box 5800
Albuquerque, NM 87185

Email: rppawlo@sandia.gov
Welcoming Remarks
Gallium Nitride Thin Film Growth Chemistry Modeling and Experimental Validation within a Movpe Reactor Showerhead System
Rinku P. Parikh1, Raymond A. Adomaitis1, Gary W. Rubloff2, Erin Robertson2, Deborah Partlow3, Darren Thomson3 and Michael Aumer3, (1)Chemical Engineering, University of Maryland, College Park, MD 20742, (2)Materials Engineering, University of Maryland, College Park, MD 20742, (3)Northrop Grumman Corporation, Electronic Systems, Linthicum, MD 21090
Development of Generalized Design Criteria for Vertical Chemical Vapor Deposition Reactors
Joungmo Cho and T.J. Mountziaris, Chemical and Biological Engineering, SUNY-Buffalo, 303 Furnas Hall, Buffalo, NY 14260
Computational Fluid Dynamics (CFD) Modeling of a Laser-Driven Aerosol Reactor
Yuanqing He, Suddha S. Talukdar and Mark T. Swihart, Chemical and Biological Engineering, University at Buffalo (SUNY), 303 Furnas Hall, Buffalo, NY 14260-4200
Experimental Results from a Spatially Programmable Chemical Vapor Deposition System
Ramaswamy Sreenivasan, Chemical Engineering, University of Maryland, A.V.Williams Building, College Park, MD 20940, Raymond A. Adomaitis, Chemical Engineering, University of Maryland, College Park, MD 20742, Gary W. Rubloff, Institute for Systems Research, University of Maryland, 2145 A.V. Williams Bldg., College Park, MD 20742 and Yuhong Cai, Materials Science and Engineering, University of Maryland,, College Park,, MD MD 20742
Non-Lithographic Micropatterning of Thin Crystal Film Layers and Bulk Micro-Machining Via Hydrogel Stamping
Stoyan K. Smoukov, Christopher J. Campbell, Kyle J.M. Bishop and Bartosz A. Grzybowski, Dept of Chemical and Biological Engineering, Northwestern University, 2145 Sheridan Rd/TechE136, Evanston, IL 60208
Concluding Remarks

Materials Engineering and Sciences Division