Preliminary Program subject to change
08E13 Advances in Nanolithography
OverviewThis session features papers concerning the advancement in lithography process for information and biological applications at the nanometer scale. The areas include photo/electron/ion-beam lithography and other emerging techniques like soft lithography, imprint lithography, directed self-assembly, shadow lithography, and scanning probe. Exemplary topics include (but not limit to) fundamental chemical processes in nanolithography, photoresist formulation, photopolymerization, photo/electron optics optimization, multilayer alignment technique, and new routes for high-throughput scalability.
Primary SponsorElectronics and Photonics (08e)

Chair

Chih-hung (Alex) Chang
Assistant Professor
Oregon State University
Department of Chemical Engineering
Oregon State University
Corvallis, OR 97331
Phone Number: 5417378548
Fax Number: 5417374600
Email: CHANGCH@che.orst.edu

CoChair

Bruce J. Hinds
Assistant Professor
University of Kentucky
177 Anderson Tower, CME-0046
Lexington KY, KY 40506-0046
Phone Number: 859 257 2300 x303
Email: bjhinds@engr.uky.edu
Intact Transfer of Layered Bionanocomposite Arrays
Neeraj Kohli, Michigan State University, 4634 South Hagadorn, Apt D-7, East Lansing, Mi 48823, Robert M. Worden, Michigan State University, Department of Chemical Engineering and Materials science, Michigan state university, East Lansing, MI 48824-1226 and Ilsoon Lee, Michigan State University, Department of Chemical Engineering and Materials Science, 2527 Engineering Building, East Lansing, MI 48824
Enhancement of Lithography Processes Using Co2: Co2-Modified Development and Post Applied Bake
Amy E. Zweber, Chemical and Biomolecular Engineering Department, North Carolina State University, 1017 Main Campus Drive, Suite 3500, Raleigh, NC 27606, Joseph M. DeSimone, Chemistry Department, University of North Carolina, Chapel Hill, NC 27599 and Ruben G. Carbonell, Chemical and Biomolecular Engineering Department, Kenan Institute for Engineering, Technology & Science, NC State University, Partners Building 1, Suite 3200, Box 7006, Raleigh, NC 27695-7006
Directed Self-Assembly of Block Copolymer Blends into Nonregular Device-Oriented Structures
Mark P. Stoykovich1, Marcus Mueller2, Sang Ouk Kim1, Harun H. Solak3, Erik W. Edwards1, Juan J. De Pablo1 and Paul F. Nealey1, (1)Department of Chemical and Biological Engineering, University of Wisconsin, Madison, WI 53706, (2)Department of Physics, University of Wisconsin, Madison, WI 53706, (3)Laboratory for Micro- and Nanotechnology, Paul Scherrer Institute, Villigen-PSI, Switzerland
Selective Growth of Zinc Oxide Nanowires Grown from Thin Film Multilayer Structure for Shadow Lithography
Bing Hu, Nitin Chopra and Bruce Jackson Hinds, Chemical and Materials Engineering, University of Kentucky, 177 F. Paul Anderson Tower, Lexington, KY 40506-0046
Langmuir-Blodgett Technique as a Tool for the Synthesis of Nanostructures
Xiaowei Teng1, Xinyi Liang2 and Hong Yang1, (1)Chemical Engineering, University of Rochester, 206 Gavett Hall, Rochester, NY 14627, (2)Chemical Engineering, University of Rochester, 206 Gavett Hall, Rochester, 14627
Materials and Processes and High Resolution Patterning Using Thermal Cantilever Array Lithography
Clifford L. Henderson1, William P. King2, Yueming Hua1 and Shubham Saxena3, (1)School of Chemical & Biomolecular Engineering, Georgia Institute of Technology, 311 Ferst Drive NW, Atlanta, GA 30332-0100, (2)Woodruff School of Mechanical Engineering, Georgia Institute of Technology, 801 Ferst Drive N.W., Atlanta, GA 30332-0405, (3)Woodruff School of Mechanical Engineering, Georgia Institute of Technology, 311 Ferst Drive NW, Atlanta, GA 30332-0100

Materials Engineering and Sciences Division