Preliminary Program subject to change
08E01 Chemical Vapor Deposition I
OverviewWe invite papers that present recent advances in Chemical Vapor Deposition (CVD). Topics traditionally covered in this session include: CVD reactor diagnostics and modeling, scale-up issues, equipment development, novel deposition precursors, precursor delivery systems, sensors and process control, gas-phase and surface chemical reaction mechanisms, kinetics, chemically reacting flow simulations, nucleation and growth models. Applications to microelectronics, optoelectronics, thin-film coatings, synthesis of nanowires & nanotubes, and new-material development are welcome. Papers illustrating non-traditional applications of Chemical Engineering to CVD research, materials processing and advances in chemical engineering science through CVD research are especially encouraged.
Primary SponsorElectronics and Photonics (08e)

Chair

Daniel D. Burkey
Assistant Professor of Chemical Engineering
Northeastern University
342 Snell Engineering Center
360 Huntington Avenue
Boston, MA 02115
U.S.A.
Phone Number: 617-373-2993
Fax Number: 617-373-2209
Email: daniel@coe.neu.edu

CoChair

David S. Dandy
Professor
Colorado State University
Dept. of Chemical Engineering
Fort Collins, CO 80523-1370
Phone Number: 970-491-7437
Fax Number: 970-491-7369
Email: david.dandy@colostate.edu
Welcoming Remarks
Preparation of Hydrophobic Multilayers on Solid Surfaces
Anfeng Wang1, Jeff Chinn2, Xuemei Liang1, Ting Cao1, Haiying Tang1, Steven O. Salley1, Gregory W. Auner3 and K. Y. Simon Ng1, (1)Department of Chemical Engineering and Materials Science, Wayne State University, 5050 Anthony Wayne Dr., Detroit, MI 48202, (2)Applied Microstructures, 4425 Fortran Drive, San Jose, CA 95134, (3)Department of Electrical and Computer Engineering, Wayne State University, 5050 Anthony Wayne Drive, Detroit, MI 48202
in Situ Real-Time Diagnostics for Studying the Structural Evolution of Nanocrystalline Silicon Thin Films during Plasma Deposition
Radhika C. Mani, Department of Chemical Engineering, University of California at Santa Barbara, Santa Barbara, CA 93106-5080 and Eray S. Aydil, Chemical Engineering and Materials Science Department, University of Minnesota, 151 Amundson Hall, 421 Washington Avenue SE, Minneapolis, MN 55455-0132
Roll-to-Roll Initiated Chemical Vapor Deposition (Icvd) of Functional, Flexible Nanomaterials
Malancha Gupta, Chemical Engineering, Massachusetts Institute of Technology, 77 Massachusetts Ave, Cambridge, MA 02139 and Karen K. Gleason, Massachusetts Institute of Technology, 77 Massachusetts Ave, Cambridge, MA 02139
On-Line Apcvd of Sno2 Coatings on Glass
Mingheng Li, Glass Technology Center, PPG Industries, P.O.Box 11472, Pittsburgh, PA 15238 and James W. McCamy, PPG Industries, P.O.Box 11472, Pittsburgh, PA 15238
Metal Organic Chemical Vapor Deposition of Titanium Oxynitride Films Using Tetrakis(Diethylamino)Titanium
Xuemei Song, University of Illnois at Chicago, Chemical Engineering, 810 S Clinton St., Chicago, IL 60607 and Christos G. Takoudis, University of Illinois at Chicago, 810 S. Clinton, Chicago, IL 60607
Chemical Vapor Deposition of Palladium Seed Layers
Gregory L. Griffin, Department of Chemical Engineering, Louisiana State University, Baton Rouge, LA 70803 and Lidong Wang, Chemical Engineering, Department of Chemical Engineering, Louisiana State University, Baton Rouge, LA 70803
Deposition of WnXCY Using Allylimido Complexes CL4(Rcn)W(Nc3H5): Effect of Nh3 on Film Properties
Hiral M. Ajmera1, Tim Anderson1, Laurel L. Reitfort2 and Lisa McElwee-White2, (1)Department of Chemical Engineering, University of Florida, Gainesville, FL 32611, (2)Department of Chemistry, University of Florida, Gainesville, FL 32611
Concluding Remarks

Materials Engineering and Sciences Division