Multiscale Model for Plasma Enhanced Deposition on Nanostructures
Edward A. Evans1, Kevin Kreider2, Guanghai Zhang3, Jerry Young2, Curt Clemons2 and Alper Buldum4, (1)University of Akron, Department of Chemical Engineering, Whitby Hall 127, Akron, OH 44325, (2)Applied Mathematics, University of Akron, Akron, OH 44325, (3)Chemical Engineering, University of Akron, Akron, OH 44325, (4)Physics, University of Akron, Akron, OH 44325 |
Molecular Vapor Deposition for Enhanced Monolayer Stability and Durability
B. Kobrin1, W. Robert Ashurst2, V. Fuentes1, R. Nowak1, R. Yi1 and Jeff Chinn1, (1)Applied Microstructures, 4425 Fortran Dr., San Jose, CA 95134, (2)Chemical Engineering, Auburn University, 230 Ross Hall, Auburn, AL 36849 |
Interface Formation and Energy Level Alignment of Pentacene on GaN
John J. Uhlrich and Thomas F. Kuech, Department of Chemical Engineering, University of Wisconsin, 1415 Engineering Drive, Madison, WI 53706 |
Film Deposition on Electrostatically Suspended Nanowires by Pecvd in Dusty Plasma Reactor
Themis Matsoukas, Chemical Engineering, Penn State, 150 Fenske Laboratory, University Park, PA 16802 and Jin Cao, Air Products, Allentown, PA 18195 |
Ion-Enhanced Plasma Etching of Metal Oxides in Chlorine Based Plasmas
Ryan M. Martin1, Hans-Olof Blom2 and Jane P. Chang1, (1)Chemical Engineering, UCLA, 5532-D Boelter Hall, 420 Westwood Plaza, Los Angeles, CA 90095, (2)Uppsala University, Uppsala, Sweden |
Electron-Beam Hardening of Functionalized Polynorbornene Thin Films
Sue Ann Bidstrup Allen, Seongho Park and Paul A. Kohl, Chemical Engineering, Georgia Tech, Atlanta, GA 30332-0100 |
Remote Oxygen Plasma Growth of Mgo Films on Sic for Functional Oxide Integration
Trevor L. Goodrich, Zhuhua Cai and Katherine S. Ziemer, Chemical Engineering, Northeastern University, 360 Huntington Avenue, 148 Egan Research Center, Boston, MA 02115 |