Preliminary Program subject to change
10D06 Simulation and Control of Electronic Materials Manufacturing Systems
OverviewContributions describing the development and/or application of advanced methods for modeling, optimization and control for microelectronics manufacturing processes are solicited. Theoretical areas of interest include, but are not limited to, multiscale model development, model reduction, state estimation and nonlinear controller design, real-time batch process control and optimization, novel sensors for monitoring and control, inferential sensors and control, integration of process modeling, control, and optimization.
Primary SponsorApplied Mathematics and Numerical Analysis (10d)

Chair

Antonios Armaou
Pennsylvania State University
Department of Chemical Engineering
University Park, PA 16802-4400
Phone Number: 814-865-2574
Fax Number: 814-865-5316
Email: armaou@engr.psu.edu

CoChair

Edmund G. Seebauer
Professor
University of Illinois
Department of Chemical Engineering
600 S. Mathews
Urbana, IL 61802

Phone Number: 217-333-4402
Fax Number: 217-333-5052
Email: eseebaue@uiuc.edu
Using High Fidelity Simulation in the Design of Experiments for Optimizing Etch Uniformity in Plasma Etching Reactors
Nirmal Tatavalli Mittadar1, Demetre J. Economou2, Michael Nikolaou3, Jingang Yi4, Simon McClatchie4, Puneet Yadav4 and Andrew D. Bailey III4, (1)University of Houston, 8181 Fannin Apt#2628, Houston, TX 77054, (2)University of Houston, 4800 Calhoun Rd. Chem. Eng. Dept. S239, Houston, TX 77204, (3)Chemical Engineering, University of Houston, 4800 Calhoun Road, Houston, TX 77204-4004, (4)Lam Research Corporation, 4650 Cushing Parkway, Fremont, CA 94538-6470
Application of a Geometrically-Based Uniformity Criterion for Film Uniformity Optimization in a Planetary Gallium Nitride Cvd System
Rinku P. Parikh and Raymond A. Adomaitis, Chemical Engineering, University of Maryland, College Park, MD 20742
Effects of Sampling Rate, Metrology Delay and Process Hold on the Stability of Run-to-Run Control
An-Jhih Su, National Taiwan University, Dept. of Chemical Engineering, National Taiwan University, Taipei, 106-17, Taiwan, Cheng-Ching Yu, Chemical Engineering, National Taiwan University, Taipei, 106-17, Taiwan and Babatunde A. Ogunnaike, University of Delaware, 150 Academy St, Newark, DE 19716
A New Bayesian Approach for Improved State Estimation in Semiconductor Manufacturing Processes
Jin Wang, Advanced Process Control, Advanced Micro Devices, 5204 E. Ben White Blvd, MS 613, Austin, TX 78741 and Q. Peter He, Spansion LLC, 5204 E Ben White Blvd M/S 568, Austin, TX 78741
Pls Based Run-to-Run Controller
Junghui Chen and Fan Wang, Department of Chemical Engineering, Chung-Yuan Christian University, Chung-Li, 320, Taiwan

Computing and Systems Technology Division