Tuesday, 1 November 2005 - 1:15 PM
206c

Roll-to-Roll Initiated Chemical Vapor Deposition (Icvd) of Functional, Flexible Nanomaterials

Malancha Gupta and Karen K. Gleason. Chemical Engineering, Massachusetts Institute of Technology, 77 Massachusetts Ave, Cambridge, MA 02139

The surface modification of flexible substrates can be used to produce high strength epoxy composites, superhydrophobic polymer fiber mats, and antimicrobial fabrics. Initiated chemical vapor deposition (iCVD) is a one-step, solventless deposition method that can be used to conformally coat substrates with complex geometries such as fabrics and wires. This method can be used to deposit a wide variety of vinyl monomers with different functional groups. The scale-up of the iCVD process is needed in order to produce realistic size samples. In order to scale-up the process, the kinetic and transport mechanisms involved in the iCVD process must be fully understood. These mechanisms are being investigated in order to design an efficient roll-to-roll iCVD reactor.

See more of #206 - Chemical Vapor Deposition I (08E01)
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