| We invite papers that present recent advances in Chemical Vapor Deposition (CVD). Topics traditionally covered in this session include: CVD reactor diagnostics and modeling, scale-up issues, equipment development, novel deposition precursors, precursor delivery systems, sensors and process control, gas-phase and surface chemical reaction mechanisms, kinetics, chemically reacting flow simulations, nucleation and growth models. Applications to microelectronics, optoelectronics, thin-film coatings, synthesis of nanowires & nanotubes, and new-material development are welcome. Papers illustrating non-traditional applications of Chemical Engineering to CVD research, materials processing and advances in chemical engineering science through CVD research are especially encouraged. |
Knudsen Permeability of Fibrous Films
Xiangning Li, University of Notre Dame, 182 Fitzpatyrick Hall, Notre Dame, IN 46556 and William Strieder, Department of Chemical and Biomolecular Engineering, University of Notre Dame, 182 Fitzpatrick Hall, Notre Dame, IN 46556 |
Generalized Design Criteria for Vertical Chemical Vapor Deposition Reactors
Joungmo Cho and T. J. Mountziaris, Chemical Engineering, University of Massachusetts, Amherst, MA 01003 |
Growth and Characterization of Sic Films Deposited in a Large-Scale Lpcvd Reactor
Christopher S. Roper1, Roger T. Howe2 and Roya Maboudian1, (1)Chemical Engineering, University of California, Berkeley, 201 Gilman Hall, Berkeley, CA 94709, (2)Stanford University, Stanford, CA 94305 |
Chemical Vapor Deposition Growth and Characterization of Amorphous, Phosphorous-Doped Ruthenium Films
John G. Ekerdt1, Jihnhong Shin2, Lucas B. Henderson1, Wyatt Winkenwerder1, Abdul Waheed3 and Richard A. Jones3, (1)Chemical Engineering, University of Texas at Austin, University of Texas at Austin, Austin, TX 78712, (2)Materials Science and Engineering, University of Texas at Austin, University of Texas at Austin, Austin, TX 78712, (3)Chemistry/Biochemistry, University of Texas at Austin, University of Texas at Austin, Austin, TX 78712 |
Rapid Synthesis of Dielectric Films by Microwave Assisted Cvd
Nicholas Ndiege, Chemistry, University of Illinois, Urbana Champaign, 600 S Mathews Street, Champaign, IL 61801, Vaidyanathan Subramanian, University of Illinois, Urbana Champaign, 600 S Mathews Street, Champaign, IL 61801, Mark A. Shannon, Department of Mechanical and Industrial Engineering, University of Illinois at Urbana-Champaign, 294 RAL, MC-712, 600 S. Mathews Ave., Urbana, IL 61801 and Richard I. Masel, Chemical and Biomolecular Engineering, University of Illinois at Urbana-Champaign, 1206 W. Green St., Urbana, IL 61801 |
Metalorganic Chemical Vapor Deposition of Ingaasn Using Dilute Nitrogen Trifluoride and Tertiarybutylarsine
S. F. Cheng1, R. L. Woo1, A. M. Noori2, G. Malouf2, M. S. Goorsky2 and R. F. Hicks1, (1)Chemical Engineering, University of California, Los Angeles, 5531 Boelter Hall, Chemical Engineering Department, UCLA, 420 Westwood Plaza, Los Angeles, CA 90095, (2)Materials Science and Engineering, University of California, Los Angeles, 420 Westwood Plaza, Los Angeles, CA 90095 |
Mocvd Heterostructures of Tio2 and Al2o3 Using Cycling of Tdeat, Tma and O2
Xuemei Song, University of Illnois at Chicago, Chemical Engineering, 810 S Clinton St., Chicago, IL 60607 and Christos G. Takoudis, Chemical Engineering, University of Illnois at Chicago, Chemical Engineering, 810 S Clinton St., Chicago, IL 60607 |
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