| Preliminary Program subject to change |
| 08E02 Plasma Processing I - Co-Sponsored by the American Vacuum Society |
| Papers are solicited on the subject of low-temperature plasmas widely used in fabrication of integrated circuits, micro/nanoelectromechanical systems, and optoelectronic devices. This session will feature both modeling and experimental papers. Paper submission is encouraged in the areas of, but not limited to, plasma physics, gas phase and surface chemistry, kinetics and transport phenomena, plasma-surface interactions, diagnostics, process control, and other emerging areas of plasma science and engineering (e.g., flexible substrate electronics and photovoltaics, plasma treatment of biocompatible surfaces, environmentally benign plasma processing, and microdischarges). |
| Electronics and Photonics (08e) |
Chair
Vincent M. Donnelly
Professor
University of Houston
4800 Calhoun Rd. Chem. Eng. Dept. S232
Houston, TX 77204
Phone Number: 713-743-4313
Email: VMDonnelly@uh.edu
CoChair
Sang M. Han
Assistant Professor
University of New Mexico
Department of Chemical & Nuclear Engineering
209 Farris Engineering Center
Albuquerque, NM 87131-1341
Phone Number: 505-277-3118
Fax Number: 505-277-5433
Email: meister@unm.edu
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Effect of the Number of Pairs of Dielectric Barrier Discharge Reactor on Diesel Particulate Matter Removal and Pressure Drop
Chihiro Fushimi, Kazuhiko Madokoro, Shuiliang Yao, Yuichi Fujioka and Koichi Yamada, Chemical Research Group, Research Institute of Innovative Technology for the Earth (RITE), 9-2 Kizugawadai, Kizu-cho, Soraku-gun, 619-0292, Kyoto, Japan |
Inertial Gas Admixtures in Pecvd for Uv Absorbing Thin Films of Titanium Dioxide on Polymers
Axel Sonnenfeld, Institute of Process Engineering, ETH Zurich, Sonneggstrasse 3, ML H22, Zurich, CH-8092, Switzerland and Philipp Rudolf von Rohr, ETH Zurich, Sonneggstrasse 3, ML H19, Zurich, CH-8092, Switzerland |
Plasma Treatment of Low Density Polyethylene (Ldpe) Using an Low-Temperature Cascade Arc Torch
Mary Gilliam, Andrew Ritts and Qingsong Yu, Chemical Engineering, University of Missouri-Columbia, Columbia, MO 65211 |
Diagnostics of Inductive-Coupled Ch2f2/Cf4 Plasma Using Langmuir Probe and Quadruple Mass Spectrometry
Ta-Chin Wei and Chi-Hung Liu, Department of Chemical Engineering, Chung-Yuan University, 200 Chung-Bei Rd., Chungli, Taiwan |
Plasma Interface Engineered Coating Systems for Magnesium Alloys
Jin Zhang, College of Material Science, Chongqing Institute of Technology, Chongqing, 400050, China, YenFong Chan, University of Missouri-Columbia, Columbia, MO 65211 and Qingsong Yu, Chemical Engineering, University of Missouri-Columbia, Columbia, MO 65211 |
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