Preliminary Program subject to change
08E03 Transport Phenomena in Electronic Materials Processing
OverviewThis has been a well attended core session of area 8e for a number of years. It provides an opportunity for those interested in electronic materials to interact with experts in transport. This fits with the proposed topical conference in microelectronics. This session treats all aspects of the transport of mass, momentum and energy in electronic materials processing. Both computational and experimental papers are solicited.
Primary SponsorElectronics and Photonics (08e)

Chair

Talid R. Sinno
Assistant Professor
University of Pennsylvania
311A Towne Building
220 South 33rd Street
Philadelphia, PA 19104-6393
Phone Number: (215) 898-2511
Fax Number: (215) 573-2093
Email: talid@seas.upenn.edu

CoChair

W. Robert Ashurst
Asst. Prof.
Chemical Engineering
Auburn University
230 Ross Hall
Auburn, AL 36849
Phone Number: 334-844-2559
Fax Number: 334-844-2063
Email: ashurwr@eng.auburn.edu
Multi-Scale Simulation of Quantum Dot Formation in Metal Thin-Film Epitaxy
Yogesh Tiwary, Dept. of Chemical Engineering, The Pennsylvania State University, 174 Fenske Laboratory, University Park, PA 16802 and Kristen A. Fichthorn, Dept. of Chemical Engineering, The Pennsylvania State University, 164 Fenske Laboratory, University Park, PA 16802
Multiscale Modeling and Neural-Network Based Optimization of a Thin Film Deposition Process
Cihan Oguz and Martha Gallivan, School of Chemical & Biomolecular Engineering, Georgia Institute of Technology, Ford Environmental Science & Technology Building, 311 Ferst Drive, Atlanta, GA 30332
Analysis of Electromigration-Driven Interactions between Voids in Metallic Thin Films
Jaeseol Cho, M. Rauf Gungor and Dimitrios Maroudas, Department of Chemical Engineering, University of Massachusetts, 686 N. Pleasant Street, Amherst, MA 01003
Effect of Rotational Speed and Marangoni Stresses on Local Flow Structure in Silicon Melt of Czochralski Crystal Growth Process
Prashant Ramchandra Gunjal, Department of Chemical Engineering, Washington University in Saint Louis, Campus Box 1198,, 1 Brookings Drive, Saint Louis, MO 63130, Milind S. Kulkarni, MEMC Electronic Materials, 501 Pearl Drive, St. Peters, MO 63376 and P. A. Ramachandran, Washington University in Saint Louis, Campus Box 1198,, 1 Brookings Drive, Saint Louis, MO 63130
Defect Engineering by Short-Annealing-Time Methods for Ultrashallow Junction Formation
Charlotte Kwok1, Ramakrishnan Vaidyanathan2 and Edmund G. Seebauer2, (1)Chemical Engineering, University of Illinois, Department of Chemical Engineering, 600 S. Mathews, Urbana, IL 61802, (2)University of Illinois, Department of Chemical Engineering, 600 S. Mathews, Urbana, IL 61802
A Comprehensive Model for Coupled Oxide Precipitation and Point Defect Aggregation in Crystalline Silicon
Vijay Kumar Gupta and Talid R. Sinno, Department of Chemical and Biomolecular Engineering, University of Pennsylvania, 311A Towne Building, 220 South 33rd Street, Philadelphia, PA 19104-6393

Materials Engineering and Sciences Division