Preliminary Program subject to change
08A03 Polymer Thin Films and Interfaces III
OverviewBlock copolymer thin films provide the opportunity to design materials ideal for nanoscale applications based on their ability to self-assemble into periodic structures. This session focuses on the manipulation of thin film copolymer ordering using surfaces, electric fields, solvent annealing, topographical patterns, mechanical shearing, or other methods. Both experimental and theoretical works are welcome, and should highlight the characterization of thin film morphologies and provide useful insights into nanostructure formation.
Primary SponsorPolymers (08a)

Chair

Thomas H. Epps III
Assistant Professor
Department of Chemical Engineering
University of Delaware
150 Academy Street
215 Colburn Labs
Newark, DE 19716
Phone Number: 302-831-8941
Fax Number: 302-831-3009
Email: thepps@udel.edu

CoChair

Richard Elliott
Professor
University of Akron
Chem Eng Dept
Akron, OH 44325-3906
Phone Number: 330 972 7253
Fax Number: 330 972 5856
Email: jelliott@uakron.edu

* Membership Number 112293
Introductory Remarks
Investigation of Block Copolymer Behavior on Patterned
George J. Papakonstantopoulos1, Kostas Daoulas2, Francois Detcheverry1, Marcus Muller2, Paul F. Nealey3 and Juan J. De Pablo4, (1)Department of Chemical and Biological Engineering, University of Wisconsin - Madison, 1415 Engineering Dr, Madison, WI 53706, (2)Institut fur Theoretische Physik, Georg-August Universitat, Gottingen, ---, Germany, (3)University of Wisconsin, 1415 Engineering Drive, Madison, WI 53706, (4)Department of Chemical and Biological Engineering, University of Wisconsin-Madison, Madison, WI 53706
Symmetry Breaking in Block Copolymer Thin Films
Eric Cochran1, Gila E. Stein2, Glenn H. Fredrickson2 and Edward Kramer2, (1)Chemical and Biological Engineering, Iowa State University, 1035 Sweeny Hall, Iowa State University, Ames, IA 50011-2230, (2)Materials Research Lab, University of California, Santa Barbara, CA 93106
Self Assembly of Rod-Coil Block Copolymers and Homopolymers
Yuefei Tao, Dept. of Chemical Engineering, University of California Berkeley, Berkeley, CA 94701, Bradley D. Olsen, Chemical Engineering, University of California, Berkeley, 201 D Gilman, Berkeley, CA 94720-1462 and Rachel A. Segalman, University of California at Berkley, Dept of Chemical Engineering, 201 D Gilman, Berkeley, Ca 94720-1462
Self-Assembly of Double-Gyroid Phase Block Copolymer/Silica Thin Films
Hugh W. Hillhouse, Vikrant Urade and Michael Tate, Chemical Engineering, Purdue University, 480 Stadium Mall Drive, West Lafayette, IN 47907
Break
Selectively Probing the Glass Transition Temperature in Block Copolymer Films
Connie B. Roth, Chemical Engineering, Northwestern University, Evanston, IL 60208-3120 and John M. Torkelson, Chemical Engineering and Materials Science & Engineering, Northwestern University, Evanston, IL 60208-3120
Self-Assembly of Thin Polymer Film Via Electrohydrodynamic Instabilities
Ning Wu, chemical engineering, Princeton University, Princeton, NJ 08540, Leonard F. Pease, Department of Chemical Engineering, Princeton University, G100 Engineering Quadrangle Olden Street, Princeton, NJ 08544 and William. B. Russel, Chemical Engineering, Princeton University, Princeton, NJ 08540
Effects of Flow and Interfacial Block Copolymer on Polymer-Polymer Adhesion
Jianbin Zhang, Department of Chemical Engineering and Materials Science, University of Minnesota, 421 Washington Ave., MINNEAPOLIS, MN 55455, Timothy P. Lodge, Department of Chemistry and Department of Chemical Engineering and Materials Science, University of Minnesota and Christopher W. Macosko, Department of Chemical Engineering and Materials Science, University of Minnesota, 151 Amundson Hall, 421 Washington Avenue SE, Minneapolis, MN 55455

Materials Engineering and Sciences Division