Modeling and Process Design of an Internally Heat-Integrated Distillation Column
Keigo Matsuda1, Koichi Iwakabe2, Masaru Nakaiwa3, Toshinari Nakanishi4, Takao Ohmori5, Akira Endo5, Takuji Yamamoto5 and Sho Kataoka5, (1)Research Institute for Innovation in Sustainable Chemistry, National Institute of Advanced Industrial Science and Technology, Central 5, 1-1-1, Higashi, Tsukuba, 305-8565, Japan, (2)Project Development Department, Maruzen Petrochemical Co., Ltd., Energy-Efficient Chemical Systems Group, Research Institute for Innovation in Sustainable Chemistry, AIST Tsukuba Central 5, 1-1-1, Higashi, Tsukuba-shi, Ibaraki, 305-8565, Japan, (3)Energy-Efficient Chemical Systems Group, Research Institute for Innovation in Sustainable Chemistry, National Institute of Advanced Industrial Science and Technology, Tsukuba Central 5, 1-1-1, Higashi, Tsukuba-shi, Ibaraki, 305-8565, Japan, (4)Kimura Chemical Plants Co. Ltd., 2-1-2, Terajima Kuise, Amagasaki,, Hyogo, 660-8567, Japan, (5)Research Institute for Innovation in Sustainable Chemistry, National Institute of Advanced Industrial Science and Technology (AIST), Higashi 1-1-1, Tsukuba, Japan |
The Automated Generation of Constrained Models from Feasibility Analysis for Reactive Distillation
Scott L. Turnberg and Steinar Hauan, Chemical Engineering, Carnegie Mellon University, 5000 Forbes Ave., Pittsburgh, PA 15217 |
Reactive Distillation: Analysis of the Topology of a Reactive Residue Curve Map for a Continuous Column
Lubilanji Jean Mulopo, Diane Hildebrandt and David Glasser, COMPS, Private Bag 3, WITS 2050, Johannesburg, 2050, South Africa |
Process Analysis of Membrane Assisted Reactive Distillation
Carsten Buchaly, Peter Kreis and Andrzej Gorak, Dortmund University, Chair of Fluid Separation Processes, 44221 Dortmund, Germany |
Analysis of Absorption with Complex Reaction Kinetics
Jerry H. Meldon, tufts university, chemical and biological engineering dept, Medford, MA 02155 |
Ratesep - a New and Innovative Rate-Based Distillation Model for Amine Acid Gas Treating Processes
Chau-Chyun Chen, Selim Anavi, Hern Chen, Hailang Li, Shigeo Oba and Jianjun Peng, Aspen Technology, Inc., 10 Canal Park, Cambridge, MA 02141 |
|