Defect Engineering For Ultrashallow Junctions Using Surfaces
Edmund G. Seebauer1, Charlotte Kwok2, Ramakrishnan Vaidyanathan1, S.H. Yeong3, M. P. Srinivasan4, B. Colombeau5 and L. Chan5, (1)University of Illinois, Department of Chemical Engineering, 600 S. Mathews, Urbana, IL 61802, (2)Chemical Engineering, University of Illinois, Department of Chemical Engineering, 600 S. Mathews, Urbana, IL 61802, (3)Department of Chemical and Biomolecular Engineering, National University of Singapore, Singapore, Singapore, (4)Chemical and Biomolecular Engineering, National University of Singapore, 4 Engineering Drive 4, Singapore, Singapore, (5)Chartered Semiconductor Manufacturing Ltd, Singapore, Singapore, Singapore |
Atomic-Scale Analysis Of The Role Of Surface Cordination Defects In The Growth Of Amorphous Silicon Thin Films
Mayur S. Valipa, Tejinder Singh and Dimitrios Maroudas, University of Massachusetts, Department of Chemical Engineering, Amherst, MA 01003 |
Ab-Initio Study on Zinc Sulfide Formation Mechanism in A Cvd Reactor
Yousef Sharifi, Chemical, Materials, and Biomolecular Engineering, University of Connecticut, 191 Auditorium Rd Unit 3222, Room 204, Storrs, CT 06268 and Luke E. K. Achenie, Department of Chemical Engineering, Virginia Polytechnic Institute and State University, Randolph Hall 133, Blacksburg, VA 24061 |
Hot Wire Chemical Vapor Deposition Kinetics For Germanium Nanoparticle Growth On Extended And Patterned Hafnia Surfaces
John G. Ekerdt, Chemical Engineering, University of Texas at Austin, University of Texas at Austin, Austin, TX 78712 and Shawn S Coffee, University of Texas at Austin, University of Texas at Austin, Austin, TX 78712 |
In-Situ Characterization of Dynamics of Impurity Absorption and Outgassing in Porous Low-K Dielectric Thin Films
Asad Iqbal1, Junpin Yao1, Harpreet Juneja1, Farhang Shadman1 and Roger P Sperline2, (1)Department of Chemical and Environmental Engineering, The University of Arizona, Tucson, AZ 85721, (2)Department of Chemistry, The University of Arizona, Tucson, AZ 85721 |
Reaction Rates And Mechanism For The Deposition Of Ruthenium Thin Films From Supercritical Carbon Dioxide
Christos F. Karanikas, Chemical Engineering, University of Massachusetts - Amherst, 686 N. Pleasant Street, Amherst, MA 01003 and James J. Watkins, Polymer Science and Engineering, University of Massachussets - Amherst, 120 Governors Drive, Amherst, MA 01003 |
Study of Low-K Film Repair and Pore Sealing Using Chlorosilanes Dissolved in Supercritical Carbon Dioxide
Eduardo Vyhmeister1, David Suleiman1, L. Antonio Estévez1 and Anthony J. Muscat2, (1)Department of Chemical Engineering, University of Puerto Rico, P.O. Box 9046, Mayaguez, PR 00681-9046, (2)Chemical and Environmental Engineering, University of Arizona, P.O. Box 210011, Tucson, AZ 85721 |
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