This preliminary program is subject to change.

Process Monitoring, Fault Detection and Diagnosis


Description:
The emphasis of this session is on theoretical and application studies related to fault detection and diagnosis for batch and continuous processes. Higher priority will be given to industrial contributions and real-time studies. Contributions are sought in, but not limited to, the following areas: Novel techniques or advances in existing techniques in fault detection, identification, and diagnosis. Process monitoring system for flexible manufacturing plants with multiple product recipes and various operating conditions. Incorporation of process knowledge into fault detection, identification, and diagnosis. Model maintenance issues (such as adaptive model, model update, etc.) for on-line applications, data pre-processing issues (such as outlier detection, sensor validation, filtering, missing value estimation, etc.) for on-line applications.

Sponsor:
Computers in Operations and Information Processing


Chair:
Randy Esposito
Staff Scientist
Nalco Company
1601 West Diehl Road
Naperville, IL 60563
Phone Number: (630) 305-1126
Fax Number: (630) 305-2982
Email: wresposito@nalco.com

Co-Chair:
Qinghua He

Papers:
Root Cause Analyis of Closed Loop Oscillatory Systems
Ulaganathan Nallasivam, Clarkson University; Babji Srinivasan, Texas Tech University; Raghunathan Rengaswamy, Texas Tech University
Fault Detection and Diagnosis of Chemical Processes by An Immune-System Inspired Approach
Kaushik Ghosh, National University of Singapore; Rajagopalan Srinivasan, National University of Singapore
Semisupervised Methodology for Fault Diagnosis in Chemical Plants
Isaac Monroy Sr., Polytechnic University of Catalonia; Raul Benitez, Polytechnic University of Catalonia; Gerard Escudero, Polytechnic University of Catalonia; Moisès Graells, Polytechnic University of Catalonia
Implementation of a Multivariate Statistical Process Monitoring Scheme to a Fed Batch Fermentation Process
Gregory M. Troup, Merck & Co. Inc.; Louis Obando, Merck & Co. Inc.; Marcus Boyer, Merck & Co. Inc.
On-Line Monitoring of Tubular Microreactors Using Particle Filter
Jun-ichi Kano, Kyoto University; Osamu Tonomura, Kyoto University; Manabu Kano, Kyoto University; Shinji Hasebe, Kyoto University
See more of this Group/Topical: Computing and Systems Technology Division