Abstract: A Highly Ordered Nanostructured Surface for Ultra-Sensitive SERS and the Detection of Rhodamine-G and DNA at Trace Levels (2010 Annual Meeting)

Thursday, November 11, 2010: 12:30 PM

250 F Room (Salt Palace Convention Center)

Ajay Agarwal¹, K.D. Buddharaju¹, Effendi Widjaja², Mohamed Khalid Nizamudin², Shaik Mohamed Salim² and Marc Garland², (1)Institute of Microelectronics, A*STAR (Agency for Science, Technology and Research),, Singapore, Singapore, (2)Process Science and Modelling, Institute of Chemical and Engineering Sciences, Singapore, Singapore

A SERS active substrate is fabricated based on well-ordered silicon nanostructure, using standard Si nanofabrication process technologies. This substrate has ordered silicon nanostructures with sharp edges and sub-100nm gaps followed by silver (30nm) and gold (15nm) deposition. These SERS substrates were measured using a InVia Raman microscope. Considerably enhanced Raman scattering was observed for a variety of test compounds. In particular, Rhodamine 6G and DNA were detected down to the 10-12M level.

[1] R. Z. Tan, A. Agarwal, N. Balasubramanian, D. L. Kwong, 3D Arrays of SERS Substrate for Ultrasensitive Molecular Detection, Sensors and Actuators A 139 (2007) 36–41.

[2] A. Agarwal, C. Fang, KD Buddharaju, N. Balasubramanian1, D.L. Kwong, N. Md. Khalid, S. M. Salim, E. Widjaja and M. Garland, Transducers'07 and Eurosensors XXI (2007), U970-U971

Extended Abstract: File Not Uploaded

See more of this Session: Nanostructured Materials for Electronic and Photonic Applications
See more of this Group/Topical: Materials Engineering and Sciences Division