Elucidating the Formation of Block Copolymer Nanostructures On Patterned Surfaces: A Self-Consistent Field Theory Study

Chemically patterned substrates can direct the assembly of adsorbed layers or thin films of block copolymers. Here, we consider the self-assembly of a lamella-forming diblock copolymer on periodically stripe-patterned substrates. The morphology of the block copolymer follows the pattern at the substrate; however, with an increasing mismatch between the width of the stripe-pattern and the natural spacing of bulk block copolymer, novel morphologies have been found. Hence, the degree of mismatch between the width of the stripe-pattern on the substrate and the natural spacing of the bulk block copolymer can be effectively used to control the morphology of thin copolymer films. These results demonstrate a promising strategy for fabrication of complex interfacial nanostructures from chemically patterned templates.