Session: Plasma Science and Technology (2012 Annual Meeting)

Description:

A plasma is a state of matter similar to gas in which a certain portion of the particles are ionized. Plasmas can be formed in vacuum, in gases, or in liquids, and are widely utilized in a variety of industries for the deposition and etching of thin films. This session will examine advances in the fundamental study and application of plasmas.

Sponsor:

Electronics and Photonics

Chair:

Selma Mededovic
Professor
Clarkson University
Dept. of Chemical and Biomolecular Engineering
Potsdam, NY 13699-5705
Phone Number: 315-268-4423
Email: smededov@clarkson.edu

Papers:

369a

Pulsed Laser Ablation in near-Critical Carbon Dioxide for Nanoparticle Fabrication
Motonobu Goto, Nagoya University; Siti Machmudah, Nagoya University; Wahyu Diono, Nagoya University

369b

Plasma-Induced Evolution of Surfaces
Karl D. Hammond, University of Tennessee; Faiza Sefta, University of California, Berkeley; Brian D. Wirth, University of Tennessee, Knoxville

369c

Mathematical Modeling of Electrical Discharges in Liquid Water: The Chemistry Inside the Plasma Channel
Joshua Franclemont, Clarkson University; Selma Mededovic, Clarkson University

369d

Predictions of the Etch Behavior of Complex Oxide Films for High-k and Multiferroic Applications
Nathan P. Marchack, University of California, Los Angeles; Jack Chen, University of California Los Angeles; Jane P. Chang, University of California, Los Angeles

See more of this Group/Topical: Materials Engineering and Sciences Division

<< Previous Session | Next Session >>