Session: Self Assembly in Thin Films and Confined Geometries (2012 Annual Meeting)

Description:

Block copolymer thin films provide the opportunity to design materials ideal for nanoscale applications based on their ability to self-assemble into periodic structures. This session highlights recent experimental, theoretical, and computational developments related to designing, manipulating, characterizing, or utilizing the nanoscale architectures afforded in thin films. Contributions related to the synthesis and assembly of novel functional thin film materials, directed assembly, high-throughput techniques, thermodynamics of thin film processing, and structure-property relationships are encouraged. Applications of the films including, but not limited to, patterning, membranes, biological templates, electronics, and photonics are also welcome.

Sponsor:

Polymers

Chair:

Robert Riggleman
Assistant Professor
University of Pennsylvania
Chemical and Biomolecular Engineering
Philadelphia, PA 19104
Phone Number: 215-898-2411
Email: rrig@seas.upenn.edu

Co-Chair:

Adam J. Nolte
Assistant Professor
Rose-Hulman Institute of Technology
Chemical Engineering
5500 Wabash Avenue
Terre Haute, IN 47803
Phone Number: 812-877-8096
Email: nolte@rose-hulman.edu

Papers:

722a

Manipulating Nanoscale Ordering in Block Copolymer Thin Films
Julie Albert, North Carolina State University; Thomas H. Epps, University of Delaware; Jon Seppala, University of Delaware; Ming Luo, University of Delaware

722b

Morphological Characterization of Self-Assembled ABC Triblock Terpolymer Thin Films
Mouge Mohagheghi, University Of Tennessee; Bamin Khomami, University of Tennessee

722c

Simulation of Contact Hole Rectification by Directed Self Assembly of Diblock Copolymers
Rahul Sharma, The Dow Chemical Company; Valeriy V. Ginzburg, The Dow Chemical Company; Jeffrey D. Weinhold, The Dow Chemical Company; Phillip D. Hustad, The Dow Chemical Company

722d

Investigation of High χ Block Copolymers for Directed Self-Assembly: Selective Block Removal of PS-b-Phost Patterns Via Selective ALD and Etch
Nathan Jarnagin, Georgia Institute of Technology; Wei-Ming Yeh, Georgia Institute of Technology; Andrew Peters, Georgia Institute of Technology; Richard Lawson, Georgia Institute of Technology; Jing Cheng, Georgia Institute of Technology; Laren M. Tolbert, Georgia Institute of Technology; Clifford Henderson, Georgia Institute of Technology

722e

Ultrathin and Transparent Nanobrick Wall Super Gas Barrier Assemblies
Laura Bolling, Texas A&M University; Morgan Priolo, Texas A&M University; Daniel Gamboa, Texas A&M University; Kevin Holder, Texas A&M University; Jaime C. Grunlan, Texas A&M University

722f

Molecular Transfer Printing Over Large Areas
Dustin W. Janes, The University of Texas at Austin; Christopher J. Thode, University of Wisconsin-Madison; Ryan P. Deschner, The University of Texas at Austin; Jeong In Lee, University of Wisconsin-Madison; M. Serdar Onses, University of Wisconsin-Madison; C. Grant Willson, The University of Texas at Austin; Paul F. Nealey, University of Wisconsin-Madison; Christopher J. Ellison, The University of Texas at Austin

722g

Glass Transitions in Layer-by-Layer Assemblies Measured Using Quartz Crystal Microbalance with Dissipation
Ajay Vidyasagar, Texas A&M University; Choonghyun Sung, Texas A&M University; Jodie Lutkenhaus, Texas A&M University

See more of this Group/Topical: Materials Engineering and Sciences Division

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