809 Gas Phase Deposition Processes

Friday, November 8, 2013: 12:30 PM
Franciscan D (Hilton)
Description:
Gas phase deposition includes a wide variety of thin film growth technologies, including physical vapor deposition (PVD), chemical vapor deposition (CVD), atomic layer deposition (ALD), and molecular beam epitaxy (MBE), as well as several other methods included within these broad topics. This session welcomes both experimental as well as theoretical contributions in this area.

Sponsor:
Electronics and Photonics

Chair:
Malancha Gupta
Email: malanchg@usc.edu

Co-Chair:
Xinhua Liang
Email: liangxin@mst.edu

- indicates paper has an Extended Abstract file available on CD.


12:30 PM
(809a) Investigation of Growth Mechanisms in Molecular Layer Deposition of Polymer Films
David Bergsman, Han Zhou and Stacey F. Bent

12:48 PM
(809b) Porous Polymer Membranes By Simultaneous Polymerization and Solid Monomer Deposition
Scott Seidel, Philip Kwong and Malancha Gupta

1:06 PM
(809c) Oxidative Chemical Vapor Deposition of Semiconducting Polymers For Integration Into Polymer Solar Cells
David C. Borrelli, Vladimir Bulovic and Karen K. Gleason

1:24 PM
(809d) Demonstration of Potential Opportunities in Photo-Initiated Chemical Vapor Deposition (piCVD)
Aravind Suresh, Daniel Anastasio and Daniel D. Burkey

1:42 PM
Break

2:00 PM
(809e) Enhanced Grain Growth in Cu2ZnSnS4 Thin Films Via Vapor Transport of Alkali Metal Impurities
Melissa Johnson, Sergey Baryshev, Elijah Thimsen, Michael Manno, Xin Zhang, Christopher Leighton and Eray S. Aydil
File available
2:18 PM
(809f) Epitaxial Growth of Thick Films of Boron Phosphide On Silicon Carbide and Its Properties
Balabalaji Padavala, Clint D Frye and James H Edgar

2:36 PM
(809g) Formation of Extreme Aspect-Ratio Semiconductor Waveguides Via High-Pressure Chemical Deposition in Microcapillaries
Seyed Pouria Motevalian, Todd D. Day, John V. Badding and Ali Borhan
See more of this Group/Topical: Materials Engineering and Sciences Division
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