532714 Probing the (Photo)Electrochemical Stability of Atomic Layer Deposited Coatings for Solar-Driven Hydrogen Evolution

David W. Palm1, Alexander DeAngelis2, Nicolas Gaillard3 and Thomas F. Jaramillo1, (1)Chemical Engineering, Stanford University, Stanford, CA, (2)University of Hawaii, Honolulu, HI, (3)Hawaii Natural Energy Institute, University of Hawaii at Manoa, Honolulu, HI
See more of this Session: Poster Session: Catalysis and Reaction Engineering (CRE) Division
See more of this Group/Topical: Catalysis and Reaction Engineering Division