Venkatachalam Avadiappan1, Blake C. Rawlings2, Christos T. Maravelias3, Stephane Lafortune4, John M. Wassick5, William Edsall5, Adam Kelloway5, Bao Lin5, Naresh N. Nandola6 and Mathias Hakenberg6, (1)Department of Chemical and Biological Engineering, University of Wisconsin – Madison, Madison, WI, (2)Electrical Engineering and Computer Science, The University of Michigan-Ann Arbor, Ann Arbor, MI, (3)Department of Chemical and Biological Engineering, University of Wisconsin-Madison, Madison, WI, (4)Electrical Engineering and Computer Science, University of Michigan, Ann Arbor, MI, (5)The Dow Chemical Company, Midland, MI, (6)Siemens, Princeton, NJ