Abstract: Modeling the UV/H<sub>2</sub>O<sub>2</Sub> Oxidation of Trace Organic Compounds in a Continuous-Flow Reactor with Reflective Walls (2018 AIChE Annual Meeting)

Tianqi Zhang, GEORGIA TECH, ATLANTA, GA, Itzel Marquez, University of Arizona, TUCSON, AZ, Robert Arnold, CHEMICAL AND ENVIRONMENTAL ENGINEERING, UNIVERSITY OF ARIZONA, TUCSON, AZ, George Diefenthal, NEOTECH AQUA, SAN DIEGO, CA and Eduardo Sáez, CHEMICAL ENGINEERING, UNIVERSITY OF ARIZONA, TUCSON, AZ

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540604 Modeling the UV/H2O2 Oxidation of Trace Organic Compounds in a Continuous-Flow Reactor with Reflective Walls

540604 Modeling the UV/H₂O₂ Oxidation of Trace Organic Compounds in a Continuous-Flow Reactor with Reflective Walls