Chlorine-Induced Degradation of Polyamide Active Layers In Reverse Osmosis and Nanofiltration Membranes

Monday, June 11, 2012
La Salle A/B (InterContinental New Orleans)
Jun Young Chung, Jung-Hyun Lee, Kathryn L. Beers and Christopher M. Stafford, Polymers Division, National Institute of Standards and Technology, Gaithersburg, MD

Understanding the degradation of reverse osmosis (RO) and nanofiltration (NF) membranes by chlorine is imperative to develop chlorine-resistant membranes, an important component that provides the desired long-term durability of membrane-based water purification modules.  In this work, we study the degradation characteristics of thin polyamide active layers used in commercial RO and NF membranes (including both m-phenylenediamine-based fully aromatic and piperazine-based semi-aromatic polyamides) upon chlorine exposure.  We approach this study by quantifying the chlorine-induced changes in the mechanical properties of the active layers under various experimental conditions (such as chlorine concentration, exposure time, and pH) by means of a combined wrinkling-cracking technique.  We also conduct measurements of the water flux and salt rejection performance of the chlorine-treated membranes under various operation conditions using a dead-end flow cell geometry.  Our results show that the chlorine-induced oxidation mechanism of the active layers depends strongly on their initial structural nature.  This finding is further supported by chemical analysis using X-ray photoelectron spectroscopy (XPS) and Fourier transform infrared spectroscopy (FTIR).

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