Crystallization of Amorphous Sputtered NiTi Thin Films
Prof. Ainissa G. Ramirez, Department of Mechanical Engineering, Yale University, P.O. Box 208284, 15 Prospect Street, Room 209, New Haven, CT 06520

Sputtered NiTi thin films are commonly deposited in an amorphous state and require a high-temperature annealing step to crystallize them.  Their crystallization process is driven by the kinetic interplay of both nucleation and growth, and their resulting microstructure dictates the martensitic transformation behavior and actuation properties.  In this paper, we present the full description of the individual contributions of nucleation and growth. Using in situ transmission electron microscopy heating methods with the Johnson-Mehl-Avrami-Kolmogorov (JMAK) theory, we are able to determine these key parameters. During heating, we observed and analyzed the microstructural development and found a correlation between the average grain size and temperature.

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The Preliminary Program for The International Conference on Shape Memory and Superelastic Technologies (May 7-11, 2006)