| Development of a New Platform of Fluorinated Photoresist Polymers | ||
| Karl R. Krause1, Kenneth W. Leffew2, George N. Lewis IV3, A. Stephen Frobese3 and Mani P. Ganti4, (1)Corporate Process Development, DuPont Engineering Research and Technology, PO Box 80249, Wilmington, DE 19880, (2)DuPont Central Research and Development, PO Box 80304, Wilmington, DE 19880, (3)DuPont Engineering Research and Technology, PO Box 80309, Wilmington, DE 19880, (4)DuPont Engineering Research and Technology, PO Box 80251, Wilmington, DE 19880 Bringing new photoresist polymers to market requires meeting a challenging set of technical and business criteria imposed by the semiconductor industry that, in many ways, goes beyond the requirements for conventional chemical process development. DuPont is developing a new platform of fluorinated polymers, based on tetrafluoroethylene and proprietary fluorinated monomers, for 193nm and 157nm imaging that delivers the improved resolution and transparency demanded by the never ending push to smaller and smaller features. The tools, practices, and experience that DuPont are using to bring these new polymers from the lab to commercial reality will be presented in a way that focuses on the key obstacles specific to this industry and how they have been overcome.
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