Preliminary Program subject to change
08E08 Particles in Semiconductor Processing
OverviewParticles, and especially nanoparticles, play many roles in the processing of semiconductors for electronic and photonic applications. Unintentionally generated particles are sources of contamination and yield loss in conventional processing. Slurries for chemical mechanical polishing (CMP) contain abrasive nanoparticles of a variety of materials. Semiconductor nanoparticles or 'quantum dots' are envisioned by many as active components of future electronic and photonic devices. This session is intended to include studies of particle formation, or or the prevention thereof, and particle behavior in any or all of these roles. Both experimental and theoretical or modeling studies are welcome.
Primary SponsorElectronics and Photonics (08e)

Chair

Stephen P. Beaudoin
Associate Professor
Purdue University
School of Chemical Engineering - Forney Hall of Chemical Engineering
480 Stadium Mall Drive
West Lafayette, IN 47907-2100
Phone Number: 765-494-7944
Fax Number: 765-494-0805
Email: sbeaudoi@purdue.edu

CoChair

Mark Swihart
Associate Professor
Chemical and Biological Engineering and Institute for Lasers, Photonics, and Biophotonics
University at Buffalo (SUNY)
303 Furnas Hall
Buffalo, NY 14260
Phone Number: 716-645-2911 x2205
Fax Number: 716-645-3822
Email: swihart@eng.buffalo.edu
First-Principles Theoretical Analysis Of The Structure And Stability Of Ii-Vi Semiconductor Nanoclusters
Tejinder Singh, T. J. Mountziaris and Dimitrios Maroudas, University of Massachusetts, Department of Chemical Engineering, Amherst, MA 01003
Computational Modeling Of Silicon Nanoparticle Formation
Hongyi Dang and Mark T. Swihart, Chemical and Biological Engineering, University at Buffalo (SUNY), 303 Furnas Hall, Buffalo, NY 14260-4200
Quantum Wire Arrays in the Framework of ETS-4 and ETS-10
Onnaz Ozkanat1, Jiangdong Deng2 and Al Sacco Jr.1, (1)Department of Chemical Engineering, Center for Advanced Microgravity Materials Processing (CAMMP), Northeastern University, 360 Huntington Ave, 147 Snell Engineering Center, Boston, MA 02115, (2)Center for Nanoscale Systems, Harvard University, 9 Oxford Street, cambridge, MA 02138
Particle Adhesion to Photomask Materials
Caitlin Kilroy, Gautam Kumar, Ravi Jaiswal and Stephen Beaudoin, School of Chemical Engineering, Purdue University, 480 Stadium Mall Drive, West Lafayette, IN 47907

Materials Engineering and Sciences Division