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Overcoming Patterning Challenges at the 32 Nm Nodes

Monday, November 17, 2008: 9:40 AM
Franklin 8 (Marriott Philadelphia Downtown)

Arpan Mahorowala, IBM, Yorktown Heights, NY

Overcoming Patterning Challenges at the 32 nm Nodes
Extended Abstract: File Not Uploaded
See more of this Session: Topics in Plasma Science and Thin Film Applications I - in Honor of Herbert H. Sawin
See more of this Group/Topical: Materials Engineering and Sciences Division