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Design of a High Throughput Microwave Plasma Reactor for Bulk Production of Metal Oxide Nanowires

Tuesday, November 18, 2008: 12:48 PM
401/402 (Marriott Philadelphia Downtown)

Jeong H. Kim, Chemical Engineering, University of Louisville, Louisville, KY
Vivekanand Kumar, Department of Chemical Engineering, University of Louisville, Louisville, KY
Mahendra K. Sunkara, Department of Chemical Engineering, University of Louisville, Louisville, KY

A novel microwave plasma reactor which can produce bulk quantity of metal oxide nanowires and nanoparticles has been successfully developed. A custom made wave applicator which produces high density of plasma jet discharge in a large volume has been designed. Low cost, very fast, large scale production of different metal oxide nanowires can be accomplished using this reactor.
Extended Abstract: File Not Uploaded
See more of this Session: Plasma Processing and Emerging Applications
See more of this Group/Topical: Materials Engineering and Sciences Division